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ASML and TSMC lead industry push for 12-inch photomasks by 2033
ONE REPORT·Published ·Event date ·Main source · The Register
Story essentials
ASML, TSMC, Intel Foundry, Samsung Electronics
Global
September 2026
Original reports
ASML and TSMC are collaborating to transition to 12-inch photomasks for high-NA EUV lithography.
The initiative aims to establish a pilot line by 2031 and full production readiness by 2033.
Intel and Samsung have also joined the effort to improve fab productivity and reduce costs.
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